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Creators/Authors contains: "Kim, S H"

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  1. Plant phytochromes are well-studied photoreceptors that sense red and far-red light, regulating photomorpho- genic development. Molecular signaling mechanisms of phytochrome A (phyA) and phyB largely overlap, especially in regulation of PHYTOCHROME-INTERACTING FACTORs (PIFs) and E3 ligase complexes composed of CONSTITUTIVELY PHOTOMORPHOGENIC 1 (COP1) and SUPPRESSORs OF phyA-105 (SPAs). However, the differences in their molecular signaling mechanisms remain unclear. Constitutively active mutants of phyB (YVB) and NLS-fused phyA (YVA:NLS) mediate light-independent seedling development, leading to constitutive photomorphogenic (cop) phenotypes in their transgenic Arabidopsis plants. Interestingly, YVB interacted with PIF3 independently of light, but YVA showed little interaction. In this study, we investigated distinct signaling mechanisms underlying the similar cop phenotypes given by YVB and YVA:NLS. Our findings indicated that YVA efficiently inactivate the COP1/SPA complex, leading to accumulation of ELONGATED HYPOCOTYL 5 (HY5) and subsequent expression of its target genes HY5 and HYH. YVB induced light-independent PIF3 and PIF1 degra- dation, in addition to HY5 accumulation. Moreover, co-expression of PIF3 in the YVB plant significantly attenuated the cop phenotypes, but minimal effects were observed in the YVA:NLS plant. In particular, PIF3 negatively regulated the interaction between YVB and COP1, which decreased HY5 accumulation in the YVB plant co-expressing PIF3. Furthermore, when transferred from light to dark, PIF3 was highly accumulated in phyB-5, whereas HY5 is degraded faster in phyA-201 compared to that in Ler. Collectively, our results suggest HY5 accumulation as the molecular bases for the cop phenotypes and also indicate that phyB is more important for regulating PIF3, whereas phyA effectively inactivates the COP1/SPA complex relative to PIF3 degradation. 
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    Free, publicly-accessible full text available June 17, 2026
  2. Abstract Surface performance is critically influenced by topography in virtually all real-world applications. The current standard practice is to describe topography using one of a few industry-standard parameters. The most commonly reported number is$$R$$ R a, the average absolute deviation of the height from the mean line (at some, not necessarily known or specified, lateral length scale). However, other parameters, particularly those that are scale-dependent, influence surface and interfacial properties; for example the local surface slope is critical for visual appearance, friction, and wear. The present Surface-Topography Challenge was launched to raise awareness for the need of a multi-scale description, but also to assess the reliability of different metrology techniques. In the resulting international collaborative effort, 153 scientists and engineers from 64 research groups and companies across 20 countries characterized statistically equivalent samples from two different surfaces: a “rough” and a “smooth” surface. The results of the 2088 measurements constitute the most comprehensive surface description ever compiled. We find wide disagreement across measurements and techniques when the lateral scale of the measurement is ignored. Consensus is established through scale-dependent parameters while removing data that violates an established resolution criterion and deviates from the majority measurements at each length scale. Our findings suggest best practices for characterizing and specifying topography. The public release of the accumulated data and presented analyses enables global reuse for further scientific investigation and benchmarking. 
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    Free, publicly-accessible full text available September 1, 2026